Intelligent, in-situ, real-time monitoring and process control is used to optimize physical and chemical properties, uniformity, texturing, cleaning and deposition processes in real time and to precisely control proprietary surface modifications and coatings. Additionally, in-situ, real-time feed-back and automation ensure tighter distribution functions and maximum yields at highest efficiency for a given manufacturing process, thereby improving manufacturing yields, and reducing losses due to short term and long term drifts. Companys yield management technology platform can also be applied to other verticals (e.g., HB-LEDs, specialty coatings, etc.).
Our solution is focused on increasing the power solar panels generate by improving the manufacturing yield and panel efficiency. We are developing solutions for both thin film solar panel manufacturers (a-Si, CIGS, CdTe) as well as for crystalline silicon solar cell manufacturers.
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The control is based on measuring the physical properties of the layers in real time as they are being deposited inside the vacuum deposition equipment.
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The control system is configurable to operate during film deposition on stationary substrates or on moving solar panels and flexible rolls.
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It provides real time analysis and property adjustment for the current layer being deposited, but also makes recommendations on how to modify the future layers to accommodate the imperfections in the current layer in order to achieve better final panel efficiency.
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The system installation uses the available vacuum ports on the deposition equipment. Miniature fiber optic sensors are placed inside the manufacturing equipment simplifying installation and eliminating the need to make time intensive, expensive and potentially warrantee voiding alterations to existing manufacturing equipment.
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Multiple optical sensors can be installed in both a parallel configuration (to monitor film uniformity over large panel area) and in a series configuration (to monitor different deposition stages of the same or different layers).
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The close proximity of the sensors to the monitored film surface allows monitoring not only the specular reflectance but also the spectral scattering of the film. This feature is essential for accurate calculation of the necessary film parameters and adequate process control.
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